Solvent free, high speed, high yield resist stripper for aqueous resist. Originally formulated to be used as a very low concentration (2%+2%) two-part makeup bath with a single part additive to maintain speed. We have also been using it as a single part makeup bath and additive process. Contains no SARA reportable ingredients.
OS-967A Resist Stripper High Speed Additive Concentrate
Description
Solvent free, high speed, high yield resist stripper for aqueous resist. Originally formulated to be used as a very low concentration (2%+2%) two-part makeup bath with a single part additive to maintain speed. We have also been using it as a single part makeup bath and additive process. Contains no SARA reportable ingredients.
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